首页> 外文OA文献 >Studies of the initial oxidation of Fe-Si alloys by AES, XPS, EELS, and LEED
【2h】

Studies of the initial oxidation of Fe-Si alloys by AES, XPS, EELS, and LEED

机译:AES,XPS,EELS和LEED对Fe-Si合金初始氧化的研究

代理获取
本网站仅为用户提供外文OA文献查询和代理获取服务,本网站没有原文。下单后我们将采用程序或人工为您竭诚获取高质量的原文,但由于OA文献来源多样且变更频繁,仍可能出现获取不到、文献不完整或与标题不符等情况,如果获取不到我们将提供退款服务。请知悉。

摘要

Thin oxide layers on polycrystalline Fe-8.75at% Si, and single crystalline Fe-6.85at% Si (110) and (111) alloys were investigated by AES (including Ar[superscript]+ and Xe[superscript]+ depth profiling), EELS, XPS and LEED during the initial oxidation stage at room temperature under very low oxygen pressure. It was observed that a very thin \u22SiO[subscript]2\u22-rich external layer is formed, as predicted by others, and established preferentially at the first stage of oxidation. A Si-depletion zone ~5 A deep was found in the polycrystalline alloy with about 25% Si-depletion at the alloy/oxide interface. The formation of an Fe silicate-like structure just beneath the Si oxide-rich top layer down to the alloy/oxide interface was also observed. Although this Fe-silicate layer was determined to be predominantly in the form of Fe[subscript]2SiO[subscript]4, gradual changes of the oxidation state of Fe from its highest oxidation state (\u22Fe[subscript]2O[subscript]3\u22-like) at the top to the lowest (\u22FeO\u22-like) at the bottom were also observed. The rates of oxidation of polycrystalline alloys were determined to be retarded to approximately 40% of the rate of pure Fe after exposure to 200 L of O[subscript]2. The best annealing conditions for each single-crystalline alloy were determined to provide the cleanest surface for the following initial oxidation experiments. Annealing at ~550°C for 20 min after Ar[superscript]+ sputter-cleaning was found to be best for Fe-Si (110). The initial oxidation results for the single-crystalline alloys were compared with those of the polycrystal alloys to show a general resemblance in the various initial oxidation features. The retardation in Fe oxidation rate with respect to that of the corresponding pure Fe surface was, however, enhanced by ~33% on (110) compared to the polycrystal case. Comparison between the (110) and (111) planes reveals only a minor crystallographic dependence of the initial oxidation of single-crystalline Fe-6.85at% Si. A general increase in the degree of the retardation of the oxidation of Fe in Fe-Si (110) was observed as the initial surface Si concentration goes up by segregation to a certain critical value, ~13at% Si. Various comparative experiments were performed to support the interpretations. ftn[superscript]1DOE Report IS-T-1343. This work was performed under contract No. W-7405-Eng-82 with the U.S. Department of Energy.
机译:通过AES(包括Ar +和Xe +深度分布图)研究了多晶Fe-8.75at%Si和单晶Fe-6.85at%Si(110)和(111)合金上的薄氧化物层,在室温下,在非常低的氧气压力下的初始氧化阶段,EELS,XPS和LEED。如其他人所预料的,观察到形成了非常薄的富含u22SiO 2的外层,并且该外层优先在氧化的第一阶段建立。在多晶合金中发现了约5 A的Si耗尽区,在合金/氧化物界面处有约25%的Si耗尽。还观察到恰好在富含Si氧化物的顶层下方直至合金/氧化物界面的Fe硅酸盐样结构的形成。尽管确定该铁硅酸盐层主要为Fe [2] 2SiO [下标] 4的形式,但Fe的氧化态从其最高氧化态(\ u22Fe [下标] 2O [下标] 3 \还观察到了顶部的u22样)到底部的最低(u22FeO \ u22样)。在暴露于200 L的O [下标] 2后,确定多晶合金的氧化速率被延迟到纯铁速率的约40%。确定每种单晶合金的最佳退火条件,以为随后的初始氧化实验提供最清洁的表面。发现在Ar +溅射清洗后于〜550°C退火20分钟对Fe-Si(110)最好。将单晶合金的初始氧化结果与多晶合金的初始氧化结果进行了比较,以显示出各种初始氧化特征的普遍相似之处。然而,与多晶情况相比,在(110)上,相对于相应的纯Fe表面,Fe氧化速率的延迟增加了〜33%。 (110)和(111)平面之间的比较表明,单晶Fe-6.85at%Si的初始氧化仅具有较小的晶体学依赖性。随着初始表面Si浓度通过偏析升高至一定的临界值〜13at%Si,观察到Fe-Si(110)中Fe的氧化延迟程度普遍增加。进行了各种比较实验以支持这些解释。 ftn [上标] 1DOE报告IS-T-1343。这项工作是根据与美国能源部签订的W-7405-Eng-82合同进行的。

著录项

  • 作者

    Lee, Young Pak;

  • 作者单位
  • 年度 1987
  • 总页数
  • 原文格式 PDF
  • 正文语种 en
  • 中图分类

相似文献

  • 外文文献
  • 中文文献
  • 专利
代理获取

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号